MM1 200-300 Mesh Copper TEM Grids with Microgrid Carbon Support Film

200–300 Mesh Copper TEM Grids with Microgrid Carbon Support Film

Product Description

Microgrid support films are specially prepared with micropores.
The pore size ranges from approximately 2.5 µm to 10 µm.
After carbon coating, the micropores remain open, allowing
specimens to be observed without film background and improving
image contrast.

Microgrid Types

Standard Microgrid Carbon Film

Standard microgrid carbon film has a pore diameter of approximately
5 µm and is mainly used for nanomaterial observation. Nanoparticles
can be positioned near the edges of the micropores, while
one-dimensional nanomaterials can span across the holes for
high-resolution observation. It is also convenient for microbeam
analysis and obtaining selected-area electron diffraction images
of individual particles.

Small-Hole Microgrid Carbon Film

Small-hole microgrid carbon film has a pore diameter of approximately
2 µm. It is commonly used for small virus particles, allowing viruses
or bacteria to adhere near the edges of the microgrid holes.
It can also be used for biological cryogenic electron microscopy
specimen observation.

FIB Microgrid

FIB microgrids have a pore diameter of approximately 8 µm and are
mainly used for TEM research after focused ion beam (FIB) specimen
preparation. The support film has high strength and good specimen
adhesion, allowing it to carry larger specimens such as microelectronic
chips for advanced nanoscale circuit research.

Silicon Nitride Microgrid

Standard silicon nitride microgrids have a pore diameter of
approximately 5 µm. They are suitable for high-temperature treatment,
deposition and growth applications, while avoiding the influence of
a carbon substrate on nanomaterial research. Coordinate-patterned
microgrids can also be used for specimen positioning, directional
observation and repeated observation of the same location.

Product Specifications